TY  - JOUR

T1  - Investigation of boron implantation into silicon by quantitative energy-filtered transmission electron microscopy

JO  - 17TH INTERNATIONAL CONFERENCE ON MICROSCOPY OF SEMICONDUCTING MATERIALS 2011

PY  - 2011/01/01

AU  - Walther T

AU  - England J

AU  - IOP

ED  - 

DO  - DOI: 10.1088/1742-6596/326/1/012053

VL  - 326

Y2  - 2024/10/22

ER  -