TY  - JOUR

T1  - Photopatterning of self-assembled. monolayers at 244 nm and applications to the fabrication of functional microstructures and nanostructures

JO  - NANOTECHNOLOGY

PY  - 2005/09/01

AU  - Sun SQ

AU  - Chong KSL

AU  - Leggett GJ

ED  - 

DO  - DOI: 10.1088/0957-4484/16/9/065

VL  - 16

IS  - 9

SP  - 1798

EP  - 1808

Y2  - 2024/10/23

ER  -