@article{article, title = {{Role of Positive Ions in Determining the Deposition Rate and Film Chemistry of Continuous Wave Hexamethyl Disiloxane Plasmas}}, publisher = {{American Chemical Society (ACS)}}, url = {{http://dx.doi.org/10.1021/la202010n }}, year = {{2011}}, month = {{9}}, author = {{Michelmore A and Bryant PM and Steele DA and Vasilev K and Bradley JW and Short RD}}, doi = {{10.1021/la202010n}}, volume = {{27}}, journal = {{Langmuir}}, issue = {{19}}, pages = {{11943-11950}}, note = {{Accessed on 2025/04/08}}}